PVD

  • Varian XM-90
  • Varian-3000
  • Varian-M2000
  • Varian-M2i
  • Varian-MB2
  • Endura
  • Fronos

More info

CVD

  • Concept-One
  • Concept 2 Sequel
  • Concept 2 Altus
  • Concept 2 Speed
  • Ultima

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Etcher

  • E-MAX
  • Centura DPS

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Chemical

  • Si Source
  • Ti Source
  • Zr Source
  • Hf Source
  • other Source

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Battery

  • FPD Equipments
  • Cell Equipments

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Ashing System

L3510

Gasonics
Wafer size : 4" to 8"
Damage free process
Downstream Plasma
No metal grids between plasma tube and wafer

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PEP3510

Gasonics
Wafer size : 6" to 8"
Damage-free downstream microwave 1.2kW source
Optical endpoint detection system
Dual blade wafer handler
Dual chamber processing
Platen and lamp wafer heating for process flexibility

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Chemical Mechanical Polishing

EBARA EPO222

Wafer Grinding, Lapping & Polishing Equipment
Back & Front side deposition process
Module design
Dry-In / Dry-Out

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Mira Mesa

automated dry-in dry-out system
CMP robot, input shuttle and walking beam are the wafer handling mechanisms

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